-
1 ion-beam lithography
Англо-русский словарь технических терминов > ion-beam lithography
-
2 ion-beam lithography
1) Техника: ионно-лучевая литография, ионолитография2) Микроэлектроника: ионная литография -
3 ion-beam lithography
Makarov: IBLУниверсальный русско-английский словарь > ion-beam lithography
-
4 ion-beam lithography
< prod> ■ Ionenstrahllithographie f -
5 ion-beam lithography
іонна [іонно-променева] літографіяEnglish-Ukrainian dictionary of microelectronics > ion-beam lithography
-
6 ion-beam lithography
English-russian dictionary of physics > ion-beam lithography
-
7 ion-beam lithography
ионная литография, ионно-лучевая литографияEnglish-Russian electronics dictionary > ion-beam lithography
-
8 ion-beam lithography
ионная литография, ионно-лучевая литографияThe New English-Russian Dictionary of Radio-electronics > ion-beam lithography
-
9 ion-beam lithography
nELECTRON litografía por haz de iones f -
10 ion-beam lithography
English-Russian dictionary of microelectronics > ion-beam lithography
-
11 ion-beam lithography
English-Russian dictionary of electronics > ion-beam lithography
-
12 ion-beam lithography setup
Микроэлектроника: установка ионно-лучевой литографииУниверсальный англо-русский словарь > ion-beam lithography setup
-
13 ion-beam lithography setup
устаткування іонно-променевої літографіїEnglish-Ukrainian dictionary of microelectronics > ion-beam lithography setup
-
14 ion-beam lithography setup
English-Russian dictionary of microelectronics > ion-beam lithography setup
-
15 focused ion-beam lithography
English-Russian big polytechnic dictionary > focused ion-beam lithography
-
16 focused ion-beam lithography
2) Микроэлектроника: литография с фокусируемым лучомУниверсальный англо-русский словарь > focused ion-beam lithography
-
17 scanning ion-beam lithography
Микроэлектроника: сканирующая ионная литографияУниверсальный англо-русский словарь > scanning ion-beam lithography
-
18 focused ion-beam lithography
Engineering: FIBLУниверсальный русско-английский словарь > focused ion-beam lithography
-
19 Masked Ion Beam Lithography
сущ.Универсальный немецко-русский словарь > Masked Ion Beam Lithography
-
20 Masked Ion Beam Lithography
microel. MIBLУниверсальный русско-немецкий словарь > Masked Ion Beam Lithography
См. также в других словарях:
Ion beam lithography — By analogy to E beam lithography, focused ion beam lithography scans an ion beam across a surface to form a pattern. The ion beam may be used for directly sputtering the surface, or may induce chemical reactions in the exposed top layer (resist) … Wikipedia
ion-beam lithography — jonpluoštė litografija statusas T sritis radioelektronika atitikmenys: angl. ion beam lithography; ion beam printing vok. Ionenstrahllithografie, f rus. ионная литография, f; ионно пучковая литография, f pranc. lithographie par faisceau ionique,… … Radioelektronikos terminų žodynas
focused ion-beam lithography — fokusuojamoji jonpluoštė litografija statusas T sritis radioelektronika atitikmenys: angl. focused ion beam lithography vok. Lithografie mittels fokussierter Ionenstrahlen, f rus. литография с фокусируемым ионным пучком, f pranc. lithographie par … Radioelektronikos terminų žodynas
ion-beam printing — jonpluoštė litografija statusas T sritis radioelektronika atitikmenys: angl. ion beam lithography; ion beam printing vok. Ionenstrahllithografie, f rus. ионная литография, f; ионно пучковая литография, f pranc. lithographie par faisceau ionique,… … Radioelektronikos terminų žodynas
Electron beam lithography — (often abbreviated as e beam lithography) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film (called the resist),cite book |last= McCord |first=M. A. |coauthors=M. J. Rooks |title=… … Wikipedia
Next-generation lithography — (NGL) is a term used in integrated circuit manufacturing to describe the lithography technologies slated to replace photolithography. As of 2009 the most advanced form of photolithography is immersion lithography, in which water is used as an… … Wikipedia
Electron Beam Ion Source — Eine Electron Beam Ion Trap (EBIT, Elektronenstrahl Ionenfalle) ist eine spezielle Art von Ionenfalle. Dieser Typ Falle eignet sich insbesondere für die Erzeugung und Speicherung hochgeladener Ionen. In ihr werden niedriggeladene Ionen… … Deutsch Wikipedia
Electron Beam Ion Trap — Eine Electron Beam Ion Trap (EBIT) bzw. Elektronenstrahl Ionenfalle ist eine spezielle Art von Ionenfalle. Dieser Typ Falle eignet sich insbesondere für die Erzeugung und Speicherung hochgeladener Ionen. In ihr werden niedriggeladene Ionen… … Deutsch Wikipedia
Electron beam ion trap — (or its acronym EBIT) is used in physics to denote an electromagnetic bottle that produces and confines highly charged ions. It was invented by R. Marrs [Levine et al, 1988] and M. Levine at LLNL.An EBIT uses an electron beam focused by means of… … Wikipedia
Maskless lithography — In maskless lithography, the radiation that is used to expose a photosensitive emulsion (or photoresist) is not projected from, or transmitted through, a photomask.[1] Instead, most commonly, the radiation is focused to a narrow beam. The beam is … Wikipedia
Nanoimprint lithography — is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint… … Wikipedia